JPH04587B2 - - Google Patents
Info
- Publication number
- JPH04587B2 JPH04587B2 JP11666086A JP11666086A JPH04587B2 JP H04587 B2 JPH04587 B2 JP H04587B2 JP 11666086 A JP11666086 A JP 11666086A JP 11666086 A JP11666086 A JP 11666086A JP H04587 B2 JPH04587 B2 JP H04587B2
- Authority
- JP
- Japan
- Prior art keywords
- pattern
- vernier
- main scale
- square
- scale
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 239000004065 semiconductor Substances 0.000 claims description 9
- 238000000206 photolithography Methods 0.000 claims description 8
- 238000000034 method Methods 0.000 claims description 7
- 238000011156 evaluation Methods 0.000 claims description 3
- 238000004519 manufacturing process Methods 0.000 description 6
- 230000007261 regionalization Effects 0.000 description 5
- 235000012431 wafers Nutrition 0.000 description 5
- 238000010586 diagram Methods 0.000 description 3
- 238000010894 electron beam technology Methods 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 229920002120 photoresistant polymer Polymers 0.000 description 2
- 238000011179 visual inspection Methods 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 238000001514 detection method Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000000609 electron-beam lithography Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000001459 lithography Methods 0.000 description 1
Landscapes
- Testing Or Measuring Of Semiconductors Or The Like (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP61116660A JPS62273725A (ja) | 1986-05-21 | 1986-05-21 | マスク合わせ精度評価用バ−ニアパタ−ン |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP61116660A JPS62273725A (ja) | 1986-05-21 | 1986-05-21 | マスク合わせ精度評価用バ−ニアパタ−ン |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS62273725A JPS62273725A (ja) | 1987-11-27 |
| JPH04587B2 true JPH04587B2 (en]) | 1992-01-08 |
Family
ID=14692741
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP61116660A Granted JPS62273725A (ja) | 1986-05-21 | 1986-05-21 | マスク合わせ精度評価用バ−ニアパタ−ン |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS62273725A (en]) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2666859B2 (ja) * | 1988-11-25 | 1997-10-22 | 日本電気株式会社 | 目合せ用バーニヤパターンを備えた半導体装置 |
| KR20000045476A (ko) * | 1998-12-30 | 2000-07-15 | 김영환 | 반도체소자의 테스트 패턴 |
| JP6037876B2 (ja) * | 2013-02-12 | 2016-12-07 | 東芝情報システム株式会社 | 半導体装置、積層ズレ測定装置及び積層ズレ測定方法 |
-
1986
- 1986-05-21 JP JP61116660A patent/JPS62273725A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS62273725A (ja) | 1987-11-27 |
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